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Radiation Protection Dosimetry 33:91-94 (1990)
© 1990 Oxford University Press

Influence of the Cooling Rate on Repeatability of LiF:Mg,Cu,P Thermoluminescent Chips

T.M. Piters and A.J.J. Bos

This paper presents the results of an investigation into the change of sensitivity of LiF:Mg,Cu,P (trade name GR-200) after repeated usage. The cooling rate in the annealing procedure (10 min at 240 oC) was taken as parameter. Two different production batches of GR-200 (named A and B) were used. Cooling rates were chosen from 1 K.min-1 to approximately 230 K.min-1. The results show that the cooling rate in the annealing procedure of GR-200 is an important parameter. It influences the glow curve pattern, the sensitivity and the repeatability. Distinct differences in repeatability between different production batches were observed. For chips annealed at a high cooling rate, the sensitivity of batch A decreased 23% after 8 re-use cycles (comprising an oven anneal, irradiation and a readout) while the sensitivity of batch B decreased 3% to 6%. The results of this study indicate that a constant sensitivity of GR-200 can be obtained by giving the material an initialisation oven anneal procedure (10 min at 240 oC followed by a fast cooling to room temperature) of at least 8 times.


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M. Lupke, F. Goblet, B. Polivka, and H. Seifert
Sensitivity loss of Lif:Mg,Cu,P thermoluminescence dosemeters caused by oven annealing
Radiat Prot Dosimetry, December 1, 2006; 121(2): 195 - 201.
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